Students have a solid knowledge of vacuum-based technologies for the production of thin films, layer systems and special layer structures. They will gain in-depth knowledge of the necessary process conditions and the atomic processes involved in physical and chemical vapor deposition and layer and structure formation. The students are thus able to establish correlations between process conditions and coating properties and apply them to practical problems.

In addition, the students gains knowledge of plasma-chemical processes and their areas of application in the high-tech and life science sectors. They will have knowledge of the intentional and unintentional generation of particles in plasmas, how this can be prevented or specifically adjusted and in which areas of application this is relevant. The student will acquire in-depth knowledge in the determination and targeted adjustment of plasma parameters using plasma diagnostic methods and the associated optimization of plasma sources and processes. This enables them to contribute to the implementation of new plasma-based processes and applications in the high-tech sector. The student will also be able to independently develop solutions to problems from various relevant specialist areas, carry out experiments and evaluate them in a qualified manner.